On September 25, 2025, the 2nd Photovoltaic Measurement and Testing Technology Conference, co-sponsored by Shanghai Solar Energy Society and Hengzhuo Photovoltaic, and guided by the Photovoltaic Special Committee of the China Metrology and Testing Society, was successfully held in Suzhou. More than 300 technical experts from major measurement and testing institutions in the photovoltaic industry, relevant academic institutions, battery and component manufacturers, relevant measurement and testing equipment manufacturers, relevant photovoltaic material manufacturers and photovoltaic power station systems gathered together to focus on the theme of "how metrology and testing can ensure the high-quality development of photovoltaics", facing the present Industry pain points, such as dark decay, sub-steady state and ultraviolet decay of various components(UVID), light and dark film and other issues, as well as the reliability and power generation performance of the whole scene are discussed in depth. As the VIP of this conference, HIUV proposed the latest film solution for the problem of ultraviolet induced attenuation (UVID).
Facing the UVID crisis
Industry pain points and financial concerns stand out
With the transformation of photovoltaic technology to N-type, the problem of UVID has become more and more prominent: ultraviolet light destroys the passivated silicon-hydrogen bond (Si-H) of the battery and the breakage of AI-O, resulting in a decrease in the effect of chemical passivation and field passivation, resulting in the decay of component power, etc., which not only affects the power generation efficiency of power plants, but also causes financial institutions to Concerns about the reliability of the period. When evaluating the financing of photovoltaic projects, the European Bank will use component BAnkability is the core consideration. The risk of power decay caused by UVID is directly related to the stability of project investment returns and has become a key bottleneck restricting industrial financing.
Break the HJT dilemma
0 migration of light-turning film + multi-splate scheme to build a strong protective wall
In response to the UVID problem of HJT components, HIUV took the lead in successfully developing a 0-migration optical film to help the industry initially overcome the pain point of UVID attenuation of HJT components. The traditional light-turning film has three major risks: light-resmitting agent migration, light-turning cut-off mutual penetration, and oxygen intrusion. Under the combined action of oxygen and ultraviolet light-rays, the light-turning agent affects the efficiency of the light-turning agent and causes the failure of the light-turning agent, which leads to the failure of the component performance. HIUV 0 migration transferThrough innovative technology, the light film closely links fluorescent substances and the film matrix resin. After 150℃ and 96 hours of rigorous testing, the back migration volume is only 0.33mg/L, and there is no fine grid migration phenomenon. Compared with the migration of 7.73mg/L and the obvious fine grid migration of the conventional optical film, the performance advantage is significant.
Not only that, HIUV further upgraded the solution and launched a multi-dimensional film system of "water-resistant + oxygen-resistant". The developed PXP oxygen-resistant film, with 0-migration optical film and anti-migration high-cut-off film, builds an all-round protective barrier. In the reliability test of HJT components, this scheme performs excellently and can effectively resist the erosion of oxygen and water vapor on components, and completely solve the problem of UVID attenuation of HJT components.
Escort the development of TOPCon
UVB2 scheme eliminates risks and expands the application boundaries of optical film
In the face of the UVID risk of TOPCon components, HIUV has accurately developed a UVB2 cut-off film solution. The UVB2 cut-off film has an efficient UVB band (280~320nm) ultraviolet absorption ability. The visible light transmittance is consistent with the conventional film, which has little impact on the power of the component, and The resin has excellent compatibility and can be evenly dispersed in the material. After testing, the UVB2 cut-off film has a small change in light transmittance and a low degree of yellowing after UV aging (UV60 test yellowing is only 0.15), which is far superior to similar products and provides long-term and reliable UVID protection for TOPCon components.
Shago Wild Scene Customization
The combination of multi-adhesive film opens up a new dimension of technology
At the same time, HIUV is not limited to a single solution, but successfully derived and applied the optical film technology from the HJT scene to the TOPCon field. In response to the complex environment of high temperature, strong ultraviolet, dust and large temperature difference in the Shago wilderness, as well as the high requirements of high-end customers for component performance, HIUV has innovatively launched a diversified high-value film combination of "light-turning film + anti-migration high cut-off film + oxygen-resistant film". This combination can not only resist UVID attenuation, but also reduce the decrease in component power caused by high temperature (up to 25W power loss), alleviate the loss of light transmittance caused by sand and dust, delay the aging of materials caused by temperature difference, provide customized protection for Shagohuang photovoltaic power plants and high-end projects, and maximize power generation efficiency. .
20 years of deep cultivation and then set off
Technological innovation empowers industry and financial trust
Since its establishment, HIUV has been engaged in the field of photovoltaic adhesive film for 20 years, and has always driven the development of the industry with technological innovation. The UVID solution launched this time is a concentrated embodiment of the strength of research and development. The company has the first patent of anti-migration optical film, which has a perfect layout in key technical fields such as PXP oxygen-resistant film and anti-migration cut-off film, forming a multi-technical route covering HJT, TOPCon and other multi-technology routes, and adapting to the diversified product matrix for regular scenes and special needs such as Shago wasteland and high-end projects.
In the future, HIUV will continue to escort the photovoltaic industry, power plant investors and financial institutions through continuous research and development of new technology products. In the global energy transferUnder the background of the accelerated promotion of the type, HIUV uses reliable adhesive film solutions to help photovoltaic modules achieve lower attenuation and higher power generation efficiency, reduce the operating losses of power plants, improve the stability of project investment returns, further strengthen the trust of financial institutions in the photovoltaic industry, and promote the photovoltaic industry to a higher quality and more sustainable Direction of development.
